Calgary, Canada

Nathan S Shedd

This inventor holds 1 USPTO granted patent. Top assignee: Haworth, Inc.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nathan S Shedd. Retrieved from https://idiyas.com/inventor/nathan-s-shedd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Nathan S. Shedd: Innovator in Wall Panel Technology

Introduction

Nathan S. Shedd is a notable inventor based in Calgary, Canada. He has made significant contributions to the field of wall panel technology, particularly with his innovative designs that enhance structural integrity and ease of assembly.

Latest Patents

Nathan holds a patent for a "Wall panel edge rail connector arrangement." This invention features a pair of upright wall panels equipped with sidewardly spaced pairs of generally parallel but inclined guide grooves. These grooves extend vertically along the outer face of the upright frame edge rails. The connector assembly includes a main activator rod with wedge members that engage the grooves, allowing for a secure and aligned connection between the edge rails.

Career Highlights

Nathan is currently employed at Haworth, Inc., where he continues to develop innovative solutions in the field of furniture and architectural design. His work focuses on improving the functionality and aesthetics of wall panel systems.

Collaborations

Throughout his career, Nathan has collaborated with talented individuals such as Aaron D. Mullin and Kevin T. Domagala. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Nathan S. Shedd's contributions to wall panel technology exemplify his commitment to innovation and design excellence. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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