Kyiv, Ukraine

Nataliya Sakhnenko

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nataliya Sakhnenko. Retrieved from https://idiyas.com/inventor/nataliya-sakhnenko-ayfbr6qa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nataliya Sakhnenko: Innovator in Document Style Adjustment Technology

Introduction

Nataliya Sakhnenko is a prominent inventor based in Kyiv, Ukraine. She has made significant contributions to the field of document processing technology. Her innovative approach focuses on enhancing user experience through effective document style adjustments.

Latest Patents

Nataliya holds a patent for a method, electronic device, and storage medium for adjusting document style. This patent outlines a process that includes obtaining a target document from a user and a style reference document. The method involves extracting document style information from the style reference document, adjusting the target document's style based on this information, and displaying the adjusted document. This invention aims to streamline the document styling process, making it more user-friendly.

Career Highlights

Nataliya is currently employed at Samsung Electronics Ltd., where she continues to innovate and develop new technologies. Her work at Samsung has allowed her to collaborate with leading experts in the field and contribute to cutting-edge projects.

Collaborations

Some of her notable coworkers include Anastasiia Cherneha and Dmytro Zhelezniakov. Their collaboration has fostered a creative environment that encourages the development of innovative solutions.

Conclusion

Nataliya Sakhnenko's contributions to document style adjustment technology exemplify her commitment to innovation. Her work not only enhances user experience but also sets a standard for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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