Nasreen Gazala Chapra

Title: The Innovative Contributions of Nasreen Gazala Chapra

Introduction

Nasreen Gazala Chapra, an accomplished inventor based in Menlo Park, California, has made significant strides in the field of semiconductor technology. With a total of four patents to her name, she is recognized for her innovative approaches to enhancing the efficiency and performance of dielectric layers in electronic components. Her work has important implications for the future of high-speed electronics and integrated circuits.

Latest Patents

One of Nasreen's latest patents is focused on "Integrated low k dielectrics and etch stops." This patent unveils a method for depositing and etching dielectric layers that not only possess low dielectric constants but also exhibit etch rates varying by at least 3:1, which is vital for forming horizontal interconnects. The innovation involves manipulating the amount of carbon or hydrogen in the dielectric layer by altering deposition conditions, allowing these low k dielectric layers to replace conventional dielectric layers in damascene applications. Furthermore, her dual damascene structure can be created using two or more dielectric layers with dielectric constants lower than approximately 4, all within a single reactor. The method carefully varies the concentration of carbon:oxygen gases, such as carbon monoxide, to achieve optimal results for vertical and horizontal interconnect formations.

Career Highlights

Nasreen is currently working at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment sector. Her expertise in the development of advanced materials has established her as a key player in her field. Throughout her career, she has contributed to a number of influential projects that aim to push the boundaries of what's possible in semiconductor technology.

Collaborations

In her journey as an inventor, Nasreen has collaborated with other esteemed professionals in the industry, including Claes H. Bjorkman and Hongquing Shan. These collaborations have enhanced her work, bringing diverse insights and expertise that have driven innovation in her projects.

Conclusion

Nasreen Gazala Chapra stands out as a pioneer in semiconductor innovation. Her patents and contributions help pave the way for advancements in electronic devices and applications. As technology continues to evolve, inventions like hers will be crucial for meeting the ever-increasing demands for faster and more efficient electronic systems.