Yamanashi, Japan

Naruhiro Nishimura

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Fanuc Corporation. Active years: 2006-2016.

USPTO Granted Patents = 5 

% Patents Active = 40.0

Average Co-Inventor Count = 1.9

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Minamitsura-gun, JP (2007)
  • Yamanashi, JP (2006 - 2016)

Company Filing History:


Years Active: 2006-2016

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5 patents (USPTO):Explore Patents

Title: Naruhiro Nishimura: Innovator in Injection Molding Technology

Introduction

Naruhiro Nishimura is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of injection molding technology, holding a total of 5 patents. His innovative designs have improved the efficiency and functionality of injection molding machines.

Latest Patents

Nishimura's latest patents include a mold mounting platen for injection molding machines. This invention features a central bearing surface that protrudes more than the peripheral bearing surface, enhancing the stability of the mold. Another notable patent is the movable platen support mechanism, which allows for precise adjustments to the horizontal tilt of the movable platen through independently tightened adjust bolts.

Career Highlights

Naruhiro Nishimura is currently employed at Fanuc Corporation, a leader in automation and robotics. His work at Fanuc has allowed him to apply his innovative ideas in practical applications, contributing to the company's reputation for excellence in technology.

Collaborations

Nishimura has collaborated with talented coworkers, including Koichi Nishimura and Masatoshi Senga. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Naruhiro Nishimura's contributions to injection molding technology exemplify the spirit of innovation. His patents reflect a commitment to enhancing manufacturing processes and improving product quality.

Profile summary based on public USPTO records.
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