Penang, Malaysia

Narayanan Meyyappan

This inventor holds 2 USPTO granted patents. Top assignees: Silterra Malayisa Sdn. Bhd., Silterra Malaysia Sdn. Bhd.. Active years: 2004-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Narayanan Meyyappan. Retrieved from https://idiyas.com/inventor/narayanan-meyyappan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: Narayanan Meyyappan: Innovator in Semiconductor Technology

Introduction

Narayanan Meyyappan is a notable inventor based in Penang, Malaysia. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to device fabrication.

Latest Patents

Meyyappan's latest patents include a method of forming ultra shallow junctions. This invention relates to the fabrication of semiconductor devices. In specific embodiments, the method involves providing a semiconductor substrate and ion implanting dopant impurities over a time period. The ion energy of implanting the dopant impurities is varied during this time, allowing for the formation of one or more doped regions extending below the surface of the semiconductor substrate. The ion energy can be adjusted continuously, in a stepwise manner, or even in a cyclical manner.

Career Highlights

Throughout his career, Narayanan Meyyappan has worked with Silterra Malaysia Sdn. Bhd., a prominent company in the semiconductor industry. His experience in this organization has contributed to his expertise and innovative capabilities in semiconductor device fabrication.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Narayanan Meyyappan's work in semiconductor technology exemplifies the spirit of innovation. His patents reflect a deep understanding of the complexities involved in device fabrication, making him a valuable contributor to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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