Akron, OH, United States of America

Napaporn Vongpanish

This inventor holds 1 USPTO granted patent. Top assignee: The University of Akron. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Napaporn Vongpanish. Retrieved from https://idiyas.com/inventor/napaporn-vongpanish

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations in Wound Care by Napaporn Vongpanish

Introduction

Napaporn Vongpanish is an accomplished inventor based in Akron, Ohio. She has made significant contributions to the field of wound care through her innovative research and development. Her work focuses on enhancing the properties of wound dressings to improve patient outcomes.

Latest Patents

Vongpanish holds a patent for "Wound dressings with enhanced gas permeation and other beneficial properties." This invention includes a wound dressing substrate that incorporates gas vesicles, rhamnolipids, and sophorolipids. The wound dressing can be either fabric-based or hydrogel-based, providing versatility in application. Additionally, methods for producing this advanced wound dressing are also outlined in her patent. She has 1 patent to her name.

Career Highlights

Napaporn Vongpanish is affiliated with the University of Akron, where she continues her research and development efforts. Her work has garnered attention for its potential to revolutionize wound care practices.

Collaborations

She collaborates with notable colleagues, including Lu-Kwang Ju and Soroosh Dashtbozorg, who contribute to her research initiatives.

Conclusion

Napaporn Vongpanish's innovative work in wound care exemplifies the impact of research on healthcare solutions. Her contributions are paving the way for improved treatment options for patients.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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