Toyonaka, Japan

Naoyuki Shirane

This inventor holds 2 USPTO granted patents. Top assignees: Ahsu Kurin Kabushiki Kaisha, Nippon Shokubai Co., Ltd., Nippon Shokubai Kagaku Kogyo Co., Ltd.. Active years: 1978-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoyuki Shirane. Retrieved from https://idiyas.com/inventor/naoyuki-shirane

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1978-1992

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2 patents (USPTO):Explore Patents

Title: Naoyuki Shirane: Innovator in Water-Absorbing Resin Technology

Introduction

Naoyuki Shirane is a notable inventor based in Toyonaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of water-absorbing resin compositions. With a total of 2 patents, his work has implications for various applications, including deodorization.

Latest Patents

Shirane's latest patents include a water-absorbing resin composition containing metallophthalocyanine. This innovative composition is designed to function as a deodorant in the presence of water. Another significant patent is for copper phthalocyanine of a novel crystal form, which exhibits a unique X-ray diffraction pattern when measured using CuK.alpha. radiation.

Career Highlights

Throughout his career, Naoyuki Shirane has worked with prominent companies such as Nippon Shokubai Kagaku Kogyo Co., Ltd. and Ahsu Kurin Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in materials science and innovation.

Collaborations

Some of his notable coworkers include Atsushi Komai and Yuji Ito. Their collaborative efforts have contributed to the advancement of Shirane's research and patent developments.

Conclusion

Naoyuki Shirane's contributions to the field of water-absorbing resin technology highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to creating practical solutions for everyday challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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