Naoyuki Goto, based in Machida, Japan, is a prolific inventor renowned for his significant contributions in the field of materials science, particularly relating to crystallized glass substrates. With an impressive portfolio of 60 patents, Goto's innovations have advanced technology and industry standards.

Latest Patents

Among his latest patents, Goto has developed a crystallized glass substrate designed to enhance performance through a unique compressive stress layer. This substrate features a specified stress depth (DOL) of 45 to 200 micrometers, corresponding to 0 MPa compressive stress, and maintains an outermost surface compressive stress (CS) ranging from 400 to 1400 MPa. Moreover, Goto's invention ensures that the product of these two parameters (CS×DOL) reaches a level of 4.8×10 or more. Another recent patent elaborates on a crystallized glass substrate with a similar compressive stress layer, indicating a central stress (CT) established through curve analysis, varying from 55 to 300 MPa.

Career Highlights

Naoyuki Goto has had a remarkable career working with notable companies such as Kabushiki Kaisha Ohara and Ohara, Inc. His passion for innovation and relentless pursuit of excellence in research have positioned him as a leading figure in his field.

Collaborations

Throughout his career, Goto has collaborated with fellow innovators and professionals, including Toshitaka Yagi and Katsuhiko Yamaguchi. These partnerships have allowed for knowledge exchange and the co-development of groundbreaking technologies.

Conclusion

Naoyuki Goto exemplifies the essence of innovation in the domain of crystallized glass substrates. His extensive patent portfolio and collaborations underscore his influence and dedication to advancing technology. As he continues to innovate, the impact of his work will undoubtedly be felt across various industries.

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