Kobe, Japan

Naoya Tonou

This inventor holds 1 USPTO granted patent. Top assignees: Denso Ten Limited, Muramoto Industry Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoya Tonou. Retrieved from https://idiyas.com/inventor/naoya-tonou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Naoya Tonou: Innovator in Printing Technology

Introduction

Naoya Tonou is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of printing technology, particularly with his innovative designs and methods. His work has led to the development of a unique printer that enhances the printing process on curved surfaces.

Latest Patents

Naoya Tonou holds a patent for a printer and printing method. This invention includes a holding part that secures a print substrate with a curved surface, allowing it to be pressed and elastically deformed. The printing part of the device performs silkscreen printing on the print surface of the substrate, which is held in place by the holding part. This innovative approach addresses challenges associated with printing on non-flat surfaces.

Career Highlights

Throughout his career, Naoya Tonou has worked with prominent companies such as Denso Ten Limited and Muramoto Industry Co., Ltd. His experience in these organizations has contributed to his expertise in the field of printing technology.

Collaborations

Naoya has collaborated with talented individuals, including Yoshinori Kagaya and Masaaki Fukushima. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Naoya Tonou's contributions to printing technology, particularly through his patented printer and printing method, showcase his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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