Nagaokakyo, Japan

Naoya Mori

This inventor holds 1 USPTO granted patent. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoya Mori. Retrieved from https://idiyas.com/inventor/naoya-mori-6wcpy5d8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naoya Mori: Optical Component Inventor

Introduction

Naoya Mori is an inventor based in Nagaokakyo, Japan. He is associated with Murata Manufacturing Co., Ltd. His patent work includes an optical component designed to redirect light while absorbing light at a specified wavelength.

Latest Patents

Mori is credited with 1 patent, titled “Optical component.” The invention describes a first block with a reflective surface, a light-absorbing member containing a metal ion, and a buffer layer positioned between them. The buffer layer’s refractive index lies between those of the block and the absorbing member. Arranged in sequence, these elements allow the block to reflect light traveling in one direction into a different direction, while the absorbing member absorbs light at a specific wavelength.

Career Highlights

Mori’s listed patent reflects work on optical components that combine light absorption and reflection through carefully selected materials and layered structures. His professional association with Murata Manufacturing connects his invention to a company active in electronics and component technologies.

Collaborations

Mori’s listed coworkers include Masaki Nagata and Yasuhiro Shimizu.

Conclusion

Naoya Mori’s patent describes a layered optical component that integrates wavelength-specific absorption with directional light reflection, highlighting his contribution to optical technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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