Kanagawa, Japan

Naoya Katsumata



Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Samukawa, JP (1990)
  • Kawasaki, JP (2011)
  • Kanagawa, JP (2010 - 2013)

Company Filing History:


Years Active: 1990-2013

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5 patents (USPTO):Explore Patents

Title: Naoya Katsumata: Innovator in Photosensitive Resin Technology

Introduction

Naoya Katsumata is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of photosensitive resin compositions, holding a total of 5 patents. His work focuses on developing advanced materials that enhance the performance and efficiency of electronic components.

Latest Patents

Katsumata's latest patents include innovative formulations for photosensitive resin compositions and dry films. One notable patent describes a photosensitive resin composition that comprises a binder polymer based on a copolymer containing benzyl (meth)acrylate, a photopolymerizable compound, and a photopolymerization initiator. This composition is designed to exhibit long-term stability, high resistance to plating and dry etching, and improved resolution and adhesion. It is particularly useful for forming photosensitive dry films.

Another significant patent involves a photosensitive laminate film intended for creating precision fine spaces in electronic parts, such as inkjet heads. This laminate film is designed to efficiently and cost-effectively form various precision fine spaces. It consists of a photosensitive composition layer supported by a transparent support film, which prevents deformation during the curing process.

Career Highlights

Throughout his career, Naoya Katsumata has worked with notable companies, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Okha Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photosensitive materials and their applications in electronics.

Collaborations

Katsumata has collaborated with several professionals in his field, including Toru Takahashi and Hiroki Maeda. These collaborations have contributed to the advancement of technology in photosensitive resin applications.

Conclusion

Naoya Katsumata is a distinguished inventor whose work in photosensitive resin technology has led to significant advancements in the field. His innovative patents and collaborations continue to influence the development of electronic components, showcasing his impact on the industry.

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