Yokkaichi, Japan

Naoto Ohsaki

This inventor holds 2 USPTO granted patents. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 2003-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoto Ohsaki. Retrieved from https://idiyas.com/inventor/naoto-ohsaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2003-2004

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2 patents (USPTO):Explore Patents

Title: Naoto Ohsaki: Innovator in Polyphenylene Ether Production

Introduction

Naoto Ohsaki is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the production of polyphenylene ether. With a total of 2 patents to his name, Ohsaki's work has had a notable impact on the industry.

Latest Patents

Ohsaki's latest patents include a "Process for producing polyphenylene ether" and a "Method of precipitating polyphenylene ether." These innovations demonstrate his expertise and commitment to advancing polymer technology.

Career Highlights

Ohsaki is currently employed at Mitsubishi Gas Chemical Company, Inc., where he continues to develop and refine processes related to polyphenylene ether. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Kiyoshi Yoshida and Hiroya Fujii. Their collective efforts contribute to the innovative environment at Mitsubishi Gas Chemical Company, Inc.

Conclusion

Naoto Ohsaki's contributions to the field of polymer chemistry, particularly through his patents and work at Mitsubishi Gas Chemical Company, Inc., highlight his role as a key innovator in the industry. His ongoing research and collaborations promise to further enhance the capabilities of polyphenylene ether production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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