This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Tokuyama Corporation. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Naoto Nomura: Innovator in Semiconductor Manufacturing
Introduction
Naoto Nomura is a prominent inventor based in Yamaguchi, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to etching solutions.
Latest Patents
Nomura holds a patent for an etching solution, a method for treating substrates with this solution, and a method for manufacturing semiconductor devices. His invention addresses the challenge of etching silicon carbonitride without affecting silicon oxide. The etching solution he developed consists of a homogeneous mixture containing phosphoric acid, water, and cerium ions. This solution provides a high etching selectivity ratio of silicon carbonitride to silicon oxide, which is crucial for the manufacturing of advanced semiconductor devices.
Career Highlights
Naoto Nomura is associated with Tokuyama Corporation, where he has been instrumental in advancing semiconductor technologies. His work has focused on improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Nomura collaborates with various professionals in his field, including his coworker Manami Oshio. Their combined expertise contributes to the innovative solutions developed at Tokuyama Corporation.
Conclusion
Naoto Nomura's contributions to semiconductor manufacturing through his patented etching solution highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile