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For the Inventor, By the Inventor

Yokohama, Japan

Naoto Nakashima

This inventor holds 8 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1987-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoto Nakashima. Retrieved from https://idiyas.com/inventor/naoto-nakashima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 5

Forward Citations = 125(Granted Patents)


Location History:

  • Yokohama, JP (1987 - 1989)
  • Kurita, JP (1991)
  • Shiga, JP (1991)

Company Filing History:

goldMedal8 out of 42,726 
 
Hitachi, Ltd.
 patents

Years Active: 1987-1991

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8 patents (USPTO):Explore Patents
1. 5008702 - Exposure method and apparatus (1991-04-16),
2. 4993837 - Method and apparatus for pattern detection (1991-02-19),
3. 4862008 - Method and apparatus for optical alignment of semiconductor by using a (1989-08-29),
4. 4819033 - Illumination apparatus for exposure (1989-04-04),
5. 4779986 - Reduction projection system alignment method and apparatus (1988-10-25),
6. 4744666 - Alignment detection optical system of projection type aligner (1988-05-17),
7. 4701050 - Semiconductor exposure apparatus and alignment method therefor (1987-10-20),
8. 4668089 - Exposure apparatus and method of aligning exposure mask with workpiece (1987-05-26),

Title: Naoto Nakashima: Innovator in Exposure Methods and Pattern Detection

Introduction

Naoto Nakashima is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of optical systems and pattern detection. With a total of 8 patents to his name, Nakashima's work has advanced the technology used in various applications.

Latest Patents

Nakashima's latest patents include an innovative exposure method and apparatus. This enlargement projection type exposure method involves deforming the shape of a substrate to eliminate distortion in an enlarged image of a pattern. The pattern is formed on a mask and projected onto the substrate through an enlargement projection system. The apparatus for this method includes an enlargement projection optical system and a substrate deforming device that uses adsorption to shape the substrate, ensuring the distortion in the enlarged image is eliminated.

Another notable patent is a method and apparatus for pattern detection. This system utilizes a highly directive laser beam emitted from a laser source. The laser beam is directed onto an uneven pattern on an object, and the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the reflected light. The optical image formed is then received by a photoelectric converting device, which produces a signal waveform representing the pattern free of the unwanted frequency signal.

Career Highlights

Nakashima is currently employed at Hitachi, Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the capabilities of optical systems used in various industries.

Collaborations

Throughout his career, Nakashima has collaborated with notable colleagues, including Yoshitada Oshida and Masataka Shiba. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Naoto Nakashima's contributions to the fields of exposure methods and pattern detection highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving complex problems in optical systems, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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