Company Filing History:
Years Active: 1994-2003
Title: The Innovations of Naoto Kuratani: Pioneer in Thin Film Technology
Introduction
Naoto Kuratani, an accomplished inventor based in Kyoto, Japan, has made significant contributions to the field of thin film technology. With a total of five patents to his name, his work focuses on methods and apparatuses that enhance the efficiency and affordability of polycrystalline silicon film production.
Latest Patents
Kuratani's latest innovations involve a thin polycrystalline silicon film forming apparatus. This method allows for the inexpensive formation of a thin polycrystalline silicon film at relatively low temperatures while maintaining high productivity. Specifically, it focuses on controlling the state of plasma to achieve an optimal emission intensity ratio of hydrogen atom radicals (Hβ) to the emission intensity of SiH* radicals within the plasma.
The plasma CVD type thin film forming apparatus includes a deposition chamber for the target substrate, a discharging electrode for plasma formation, a gas supply device, and an exhaust device. Additionally, it incorporates an emission-spectrometer and a probe measuring device, along with a control portion that manages one or more of the power supply, gas supply, and gas exhausting. This setup ensures a maintained desired state of plasma based on information gathered from the detecting devices.
Career Highlights
Kuratani currently works at Nissin Electric Co., Ltd., a company known for its advancements in electrical equipment and technology. His career has been marked by his innovative approaches to manufacturing and material science, particularly in developing cost-effective solutions for thin film production.
Collaborations
Throughout his career, Kuratani has collaborated with notable colleagues such as Akinori Ebe and Kiyoshi Ogata, contributing to a wealth of knowledge and advancements in the field. Their combined expertise has fostered a collaborative environment that promotes innovative thinking and problem-solving in thin film technology.
Conclusion
Naoto Kuratani stands out as a pivotal figure in the realm of innovations related to thin films, particularly polycrystalline silicon processes. His patented technologies not only signify a leap in manufacturing efficiency but also embody the spirit of continuous improvement in the industry. With a commitment to developing practical and effective solutions, Kuratani's contributions are sure to have a lasting impact on future advancements in thin film technologies.