Nara, Japan

Naotaka Ohtsuka

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naotaka Ohtsuka. Retrieved from https://idiyas.com/inventor/naotaka-ohtsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Naotaka Ohtsuka: Innovator in Semiconductor Laser Technology

Introduction

Naotaka Ohtsuka is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of semiconductor laser technology. His innovative work has led to the development of a unique semiconductor laser device that addresses critical challenges in power source noise suppression.

Latest Patents

Ohtsuka holds a patent for a semiconductor laser device and method for producing the same. This invention not only incorporates a semiconductor laser element and a photodetector but also includes a capacitor connected to the photodetector. This design effectively reduces the distance from the capacitor to the photodetector, thereby enhancing the power source noise suppression effect.

Career Highlights

Naotaka Ohtsuka is associated with Sharp Corporation, a leading technology company known for its innovative products. His work at Sharp has allowed him to focus on advancing semiconductor technologies and improving their applications in various fields.

Collaborations

Ohtsuka has collaborated with notable colleagues, including Toshiya Nagahama and Kazuhiro Tsuchida. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Naotaka Ohtsuka's contributions to semiconductor laser technology exemplify the impact of innovation in modern electronics. His work continues to influence advancements in the field, showcasing the importance of effective design in technology development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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