Kyoto, Japan

Naoshi Ozasa

This inventor holds 1 USPTO granted patent. Top assignee: Sanyo Chemical Industries, Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoshi Ozasa. Retrieved from https://idiyas.com/inventor/naoshi-ozasa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Naoshi Ozasa: Innovator in Photo-Curing Resin Technology

Introduction

Naoshi Ozasa is a prominent inventor based in Kyoto, Japan. He is known for his contributions to the field of photocurable resin compositions. His innovative work has led to the development of a unique resin composition that has applications in various industries.

Latest Patents

Naoshi Ozasa holds a patent for a photo-curing resin composition comprising a propenyl ether. This composition includes a propenyl ether group-containing compound with a number-average molecular weight of not less than 500, along with a cationic photopolymerization initiator. This invention enhances the efficiency and effectiveness of photocurable materials.

Career Highlights

Ozasa is associated with Sanyo Chemical Industries, Ltd., where he has made significant contributions to the development of advanced materials. His work has been instrumental in pushing the boundaries of resin technology, making it more versatile and applicable in various fields.

Collaborations

Some of his notable coworkers include Takao Saito and Kohei Maeda. Their collaborative efforts have further enriched the research and development environment at Sanyo Chemical Industries, leading to innovative solutions in material science.

Conclusion

Naoshi Ozasa's contributions to photocurable resin technology exemplify the spirit of innovation. His patent and work at Sanyo Chemical Industries highlight the importance of research and collaboration in advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…