Iwate, Japan

Naomi Onodera


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 537(Granted Patents)


Location History:

  • Oshu, JP (2014)
  • Iwate, JP (2015 - 2016)

Company Filing History:


Years Active: 2014-2016

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3 patents (USPTO):Explore Patents

Title: Naomi Onodera: Innovator in Plasma Processing Technology

Introduction

Naomi Onodera is a prominent inventor based in Iwate, Japan. She has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. Her innovative work has advanced the capabilities of thermal treatment and plasma processing apparatuses.

Latest Patents

One of her latest patents is a plasma process method that enhances the efficiency of processing objects using plasma. This method allows for the cooling of the plasma apparatus while managing the atmosphere inside. It includes a mechanism for measuring the temperature of the atmosphere and adjusting the gas intake based on preset temperature thresholds. Another notable patent is a thermal treatment apparatus designed to support multiple substrates in a reaction tube. This apparatus features gas supplying pipes and a unique heating part that optimizes the heating process for the substrates.

Career Highlights

Naomi Onodera has built a successful career at Tokyo Electron Limited, where she has been instrumental in developing advanced technologies in plasma processing. Her work has not only contributed to her company's success but has also positioned her as a leader in her field.

Collaborations

Throughout her career, Naomi has collaborated with talented individuals such as Kiyohiko Gokon and Jun Sato. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in plasma processing.

Conclusion

Naomi Onodera's contributions to plasma processing technology exemplify her dedication to innovation and excellence. Her patents and career achievements highlight her role as a leading inventor in her field.

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