Naoma Ban

Title: Naoma Ban: Innovator in Beam Irradiation and Charged-Particle Beam Devices

Introduction

Naoma Ban is a prominent inventor based in Hitachinaka, Japan. She has made significant contributions to the field of beam irradiation and charged-particle beam devices. With a total of 9 patents to her name, her work has advanced the technology used in various applications.

Latest Patents

One of her latest inventions is the Beam Irradiation Device. This device aims to propose a multi-beam irradiation system capable of correcting off-axis aberrations. It includes a beam source that emits multiple beams, an objective lens that focuses a beam on a sample, and a series of lenses that work together to direct the beams accurately. Another notable invention is the Charged-Particle Beam Device. This device is designed to move the field-of-view to an exact position, even when the field-of-view is above an actual sample. It comprises an objective lens for focusing the charged-particle beam, a deflector for moving the beam, and a control device that maintains lens conditions while acquiring images for precise adjustments.

Career Highlights

Naoma Ban has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. Her experience in these organizations has allowed her to develop and refine her innovative technologies.

Collaborations

Throughout her career, Naoma has collaborated with esteemed colleagues, including Kenji Obara and Naomasa Suzuki. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Naoma Ban is a trailblazer in the field of beam technology, with a remarkable portfolio of patents that showcase her innovative spirit. Her contributions continue to influence the industry and inspire future advancements.