Kanagawa, Japan

Naoko Onodera

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoko Onodera. Retrieved from https://idiyas.com/inventor/naoko-onodera-o5oed7sf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Naoko Onodera: Innovator in Substrate Cleaning Technology

Introduction

Naoko Onodera is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of substrate cleaning technology. Her innovative approach has led to the development of a unique method for storing cleaning brushes, which is essential for maintaining the efficiency of cleaning processes.

Latest Patents

Naoko Onodera holds a patent for a "Method and vessel for storing a substrate cleaning brush." This invention involves a method and apparatus designed to store a brush body made of a hydrophilic sponge-like porous material in a readily usable condition. The brush is stored in a vessel filled with liquid, ensuring that the brush body remains submerged and ready for use.

Career Highlights

Onodera is associated with Dainippon Screen Mfg. Co., Ltd., a company known for its advancements in manufacturing technology. Her work has been instrumental in enhancing the efficiency of cleaning processes in various applications.

Collaborations

Naoko has collaborated with notable colleagues, including Masahiro Nonomura and Akihiko Morita. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Naoko Onodera's contributions to substrate cleaning technology exemplify her innovative spirit and dedication to improving industrial processes. Her patent reflects her commitment to enhancing efficiency in cleaning applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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