Naoko Matsui

Title: Naoko Matsui: Innovator in Dry Etching Technology

Introduction

Naoko Matsui is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of materials science, particularly in the area of dry etching technology. His innovative work has implications for the production of thin magnetic films, which are essential in various electronic applications.

Latest Patents

Matsui holds a patent for a masking material for dry etching. The objective of this invention is to provide a masking material that is suitable for fine processing of magnetic films as thin as a few nanometers, such as NiFe or CoFe, which are components of TMR films. This invention simplifies the process of producing TMR elements and reduces production costs associated with facilities and materials. The masking material utilizes a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, incorporating metals like tantalum, tungsten, zirconium, or hafnium, which have increased melting or boiling points when converted into nitrides or carbides.

Career Highlights

Throughout his career, Matsui has worked with prestigious organizations, including the National Institute for Materials Science and Japan Science and Technology Corporation. His work at these institutions has allowed him to advance his research and contribute to the field of materials science significantly.

Collaborations

Matsui has collaborated with several professionals in his field, including Isao Nakatani and Kimiko Mashimo. These collaborations have enriched his research and have led to advancements in the technologies he has developed.

Conclusion

Naoko Matsui's contributions to dry etching technology highlight his innovative spirit and dedication to advancing materials science. His patent for a masking material demonstrates the potential for reducing costs and improving processes in the production of magnetic films.