Kakegawa, Japan

Naoki Ohba

This inventor holds 1 USPTO granted patent. Top assignee: Unicharm Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Ohba. Retrieved from https://idiyas.com/inventor/naoki-ohba-bnktnroq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Naoki Ohba: Innovator in Deodorant Resin Composition

Introduction

Naoki Ohba is a prominent inventor based in Kakegawa, Japan. He is known for his innovative contributions to the field of deodorant resin compositions. With a focus on enhancing product effectiveness, Ohba has made significant strides in the industry.

Latest Patents

Ohba holds a patent for a deodorant resin composition and the process for its production. This invention showcases his commitment to developing effective solutions for personal care products. His patent portfolio includes 1 patent, reflecting his dedication to innovation.

Career Highlights

Naoki Ohba is currently employed at Unicharm Corporation, a leading company in the personal care industry. His work at Unicharm has allowed him to apply his inventive skills to create products that meet consumer needs. His contributions have been instrumental in advancing the company's product offerings.

Collaborations

Ohba has collaborated with notable coworkers, including Takeru Mori and Kenji Tanaka. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Naoki Ohba is a key figure in the field of deodorant resin compositions, with a patent that highlights his innovative spirit. His work at Unicharm Corporation and collaborations with talented colleagues further emphasize his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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