This inventor holds 1 USPTO granted patent. Top assignee: Chisso Corporation. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Naoki Noda: Innovator in Acryloxypropylsilane Manufacturing
Introduction
Naoki Noda is a prominent inventor based in Chiba, Japan. He is known for his significant contributions to the field of chemical manufacturing, particularly in the production of acryloxypropylsilane. His innovative methods have paved the way for advancements in this area, showcasing his expertise and dedication to research and development.
Latest Patents
Naoki Noda holds a patent for a method of manufacturing acryloxypropylsilane. This method achieves a high degree of purity through the hydrosilation of allyl acrylate or allyl methacrylate using a hydrosilane compound. The process employs a platinum-containing compound as the catalyst and an organic phosphorus compound as the promoter. The resulting acryloxypropylsilane product is expressed by General Formula I. This patent highlights Noda's innovative approach to chemical manufacturing.
Career Highlights
Throughout his career, Naoki Noda has made significant strides in the field of chemical engineering. His work at Chisso Corporation has been instrumental in developing new methods and processes that enhance the quality and efficiency of chemical production. His dedication to innovation has earned him recognition within the industry.
Collaborations
Naoki Noda has collaborated with notable colleagues, including Yoichi Kimae and Shunji Yoshimatsu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further advancing their collective research efforts.
Conclusion
Naoki Noda's contributions to the manufacturing of acryloxypropylsilane exemplify his commitment to innovation in the chemical industry. His patent and collaborative efforts reflect a dedication to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
