Kyoto, Japan

Naoki Nagura

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Horiba, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Nagura. Retrieved from https://idiyas.com/inventor/naoki-nagura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naoki Nagura and Precision Combustion-Gas Analysis

Introduction

Naoki Nagura is an inventor associated with Kyoto, Japan, and Horiba, Ltd. His patent work focuses on accurately measuring components in combustion gas. The available information identifies 1 patent associated with him.

Latest Patents

Nagura is named on the patent “Analysis device and analysis method.” The invention describes calculating concentrations of multiple target components in combustion gas from their respective absorption measurements. These components include nitric oxide, nitrogen dioxide, nitrous oxide, ammonia, ethane, formaldehyde or acetaldehyde, sulfur dioxide, methane, and methanol or ethanol. By measuring these substances through their absorption characteristics, the device and method aim to determine their concentrations with high accuracy.

Career Highlights

Nagura’s listed patent reflects work in analytical instrumentation and gas measurement. His association with Horiba, Ltd. connects his invention to a company known for developing measurement and analysis technologies.

Collaborations

Kyoji Shibuya and Kenji Hara are identified as Nagura’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on this invention.

Conclusion

Naoki Nagura’s patent contribution centers on precise analysis of combustion-gas components, supporting accurate measurement across a broad range of gases.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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