Company Filing History:
4 out of 356 
1 out of 832,880 Years Active: 2004-2010
Title: Naoki Miyazaki: Innovator in Electrostatic Chuck Devices
Introduction
Naoki Miyazaki is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of electrostatic chuck devices, holding a total of 5 patents. His innovative designs have enhanced the efficiency and effectiveness of substrate processing in various applications.
Latest Patents
One of Naoki Miyazaki's latest patents is an advanced electrostatic chuck device. This device features a dielectric plate with a surface embossed to create multiple projections, an electrode, and an external power source. The substrate supporting surfaces of these projections are covered by conductor wiring, which electrically connects them. During substrate processing, when the embossed projections contact the back of the substrate, the potential of the back of the substrate and the conductor wiring equalizes due to charge migration. This design prevents the generation of force between the substrate and the conductor wiring, thereby avoiding any rubbing state. As a result, the electrostatic chuck device minimizes particle generation, facilitates stable substrate removal and conveyance, and achieves high yield and system operating rates.
Career Highlights
Naoki Miyazaki has worked with notable companies, including Canon Anelva Corporation. His experience in these organizations has contributed to his expertise in developing innovative technologies in the field of electrostatic chuck devices.
Collaborations
Throughout his career, Naoki has collaborated with esteemed colleagues such as Shigeru Mizuno and Masahito Ishihara. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their field.
Conclusion
Naoki Miyazaki's contributions to the development of electrostatic chuck devices have significantly impacted substrate processing technology. His innovative designs and collaborative efforts continue to drive advancements in this important area of research and development.