Mishima, Japan

Naoki Kusui

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Machine Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Kusui. Retrieved from https://idiyas.com/inventor/naoki-kusui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Naoki Kusui: Innovator in Energy Beam Pattern Drawing

Introduction

Naoki Kusui is a prominent inventor based in Mishima, Japan. He is known for his innovative contributions to the field of pattern drawing using energy beams. His work has led to advancements that enhance the accuracy and efficiency of pattern creation.

Latest Patents

Kusui holds a patent for a "Method and apparatus for drawing patterns using an energy beam." This invention focuses on reducing the amount of drawing data required while preventing irregularities in the array of patterns. It allows for patterns to be drawn with great accuracy, and it can accommodate scaling in both the X-axis and Y-axis directions. Additionally, the method utilizes symmetry to further reduce data requirements and can adapt patterns arrayed on curved lines to be drawn as if they were on straight lines.

Career Highlights

Naoki Kusui is associated with Toshiba Machine Co., Ltd., where he has made significant contributions to the company's research and development efforts. His innovative approach has positioned him as a key figure in the advancement of energy beam technology.

Collaborations

Kusui has worked alongside notable colleagues, including Akira Suzuki and Katsuji Tanaka. Their collaborative efforts have contributed to the success of various projects within their field.

Conclusion

Naoki Kusui's work in energy beam pattern drawing exemplifies the impact of innovation in technology. His patent reflects a significant advancement in the efficiency and accuracy of pattern creation, showcasing his role as a leading inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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