Tokyo, Japan

Naoki Iwaya

This inventor holds 126 USPTO granted patents and 4 published patent applications and 18 EPO patents, primarily in Image Forming Apparatus (CPC class G03G2215-2035). Top assignee: Ricoh Company, Ltd.. Active years: 2005-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Iwaya. Retrieved from https://idiyas.com/inventor/naoki-iwaya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 126 

% Patents Active = 66.7

 

Average Co-Inventor Count = 8.9

ph-index = 10

Forward Citations = 613(Granted Patents)

Forward Citations (Not Self Cited) = 316(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Kanagawa, JP (2005 - 2011)
  • Kawasaki, JP (2006 - 2012)
  • Choufu, JP (2012 - 2013)
  • Chofu, JP (2012 - 2016)
  • Tokyo, JP (2013 - 2023)

Company Filing History:


Years Active: 2005-2023

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Areas of Expertise:
Fixing Device
Image Forming Apparatus
Belt Assembly
Air Flow Generator
Thermal Conductor
Durability Enhancement
NIP Formation Member
Conveyor System
Temperature Detector
Pressing Device
Angle Adjuster
Endless Belt
126 patents (USPTO):Explore Patents

Title: Naoki Iwaya: Tokyo-based Innovator with a Strong Patent Portfolio

Introduction:

Naoki Iwaya, a highly accomplished inventor hailing from Tokyo, Japan, has made significant contributions to the field of image forming apparatuses and fixing devices. With an impressive portfolio of 126 patents, Iwaya has established himself as a leading figure in the industry. This article sheds light on his latest patents, career highlights, and notable collaborations, showcasing the innovative prowess of this Tokyo-based inventor.

Latest Patents:

Naoki Iwaya's recent patents revolve around the development of fixing devices and image forming apparatuses. Of particular significance is his patent titled "Fixing device and image forming apparatus which has an airflow generator and airflow guide." This invention utilizes a unique combination of components, including a fixing belt, nip formation pad, opposing rotator, heat source, and airflow generator to efficiently fix unfixed images on a recording medium. Another notable patent is his invention of a "Nip formation member having a base, a thermal conductor, and a stabilizer, and fixing device and image forming apparatus using the same." This invention introduces a high thermal conduction member and securing member to enhance the thermal conductivity and stability of the nip formation member.

Career Highlights:

Throughout his career, Naoki Iwaya has worked with prominent companies such as Ricoh Company, Ltd. and Ricoh Company, Limited (formerly known as Ricoii Company, Limited). At these organizations, he has contributed to groundbreaking technological advancements in the field of image forming apparatuses and fixing devices. His innovative ideas and expertise have led to numerous successful patent applications, solidifying his position as an experienced and highly respected inventor.

Collaborations:

Naoki Iwaya has had the privilege of collaborating with accomplished professionals in the industry. Notable coworkers who have shared their expertise and ideas with him include Toshihiko Shimokawa and Hiroshi Yoshinaga. These collaborations have resulted in fruitful partnerships, driving the development of cutting-edge technologies and bolstering Iwaya's innovative endeavors.

Conclusion:

Naoki Iwaya's impressive patent portfolio and contributions to the field of image forming apparatuses and fixing devices demonstrate his deep understanding of the industry and his commitment to pushing boundaries. His inventive spirit, combined with his experience at renowned companies like Ricoh, has allowed him to make significant advancements in his field. As Tokyo continues to be a hotbed for innovation, Iwaya's inventive contributions undoubtedly play a crucial role in shaping the future of image forming and fixing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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