Naoki Ito

Title: Naoki Ito: Innovator in Semiconductor Photoresist Technology

Introduction

Naoki Ito is a prominent inventor based in Samukawa, Japan. He has made significant contributions to the field of semiconductor processing, particularly in the development of photoresist materials. His innovative work has led to the creation of a unique negative-working photosensitive composition that enhances the efficiency and effectiveness of photolithographic processes.

Latest Patents

Naoki Ito holds 1 patent for his invention titled "Negative-working photosensitive composition comprising a." This composition is designed for use as a photoresist material in the photolithographic processing of semiconductor devices. It consists of a condensation product of a hydroxy-substituted diphenylamine compound and an azide compound that absorbs UV or far UV light. The resulting photoresist layer exhibits high resistance to heat and gas plasma, making it ideal for dry etching in semiconductor processing.

Career Highlights

Naoki Ito is associated with Tokyo Ohka Kogyo Co., Ltd., a leading company in the semiconductor materials industry. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to the overall efficiency and reliability of electronic devices.

Collaborations

Throughout his career, Naoki Ito has collaborated with notable colleagues, including Koichiro Hashimoto and Wataru Ishii. These partnerships have fostered innovation and have played a crucial role in the development of advanced materials for semiconductor applications.

Conclusion

Naoki Ito's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry, paving the way for future advancements in semiconductor processing.