Naoki Ise

Title: Naoki Ise: Innovator in Sputtering Technology

Introduction

Naoki Ise is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.

Latest Patents

Naoki Ise holds a patent for a sputtering target-backing plate assembly. This invention involves bonding a sputtering target and a backing plate using a brazing material. The unique aspect of his patent is the braze bonding layer, which contains a material with higher thermal conductivity than the brazing material, in an amount of 5 vol % or more and 50 vol % or less. The thickness of the braze bonding layer is specified to be between 100 µm and 700 µm. The primary objective of this invention is to prevent the seepage of the brazing material while maintaining the required thickness of the bonding layer.

Career Highlights

Naoki Ise is currently employed at JX Nippon Mining & Metals Corporation, where he continues to develop and refine technologies related to sputtering. His work has been instrumental in enhancing the efficiency and effectiveness of sputtering processes in various applications.

Collaborations

Throughout his career, Naoki has collaborated with talented individuals such as Ryosuke Sakashita and Yosuke Endo. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Naoki Ise's contributions to sputtering technology through his patent and work at JX Nippon Mining & Metals Corporation highlight his role as an influential inventor. His dedication to innovation continues to impact the industry positively.