Kasugai, Japan

Naoki Hiraoka

This inventor holds 8 USPTO granted patents. Top assignees: Fujitsu Corporation, Fujitsu Microelectronics Limited, Fujitsu Semiconductor Limited. Active years: 1997-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Hiraoka. Retrieved from https://idiyas.com/inventor/naoki-hiraoka-45ui3w11

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 1.5

ph-index = 5

Forward Citations = 72(Granted Patents)


Company Filing History:


Years Active: 1997-2011

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8 patents (USPTO):Explore Patents

Title: Naoki Hiraoka: Innovator in Chemical Solutions

Introduction

Naoki Hiraoka is a prominent inventor based in Kasugai, Japan. He has made significant contributions to the field of chemical solutions, particularly in the semiconductor fabrication process. With a total of 8 patents to his name, Hiraoka's work has had a substantial impact on the efficiency and effectiveness of chemical feeding systems.

Latest Patents

Hiraoka's latest patents include a "Chemical solution feeding apparatus and method for preparing slurry." This innovative apparatus is designed to feed slurry to an external device, featuring a preparation tank for creating the slurry, a circulation pipe for its movement, and a feeding pipe that connects to the external device. A pump is utilized to send the chemical solution from the preparation tank through the circulation and feeding pipes. Additionally, a concentration detector is positioned downstream of the pump to monitor the slurry's concentration, allowing a controller to adjust the chemical solution's concentration accordingly.

Another notable patent is the "Apparatus and method for supplying chemicals." This apparatus consists of first and second mixing tanks that mix and supply chemical slurries used in semiconductor fabrication. The design allows for continuous availability of the slurry to a processing apparatus, maximizing efficiency. While one tank supplies the slurry, the other is cleaned and prepared for the next batch.

Career Highlights

Throughout his career, Naoki Hiraoka has worked with esteemed companies such as Fujitsu Corporation and Fujitsu Microelectronics Limited. His experience in these organizations has contributed to his expertise in developing advanced chemical feeding systems.

Collaborations

Hiraoka has collaborated with notable colleagues, including Hotaka Yamamoto and Hiroshi Osuda. Their combined efforts have furthered the development of innovative solutions in the field of chemical solutions.

Conclusion

Naoki Hiraoka's contributions to the field of chemical solutions and his innovative patents demonstrate his commitment to advancing technology in semiconductor fabrication. His work continues to influence the industry, showcasing the importance of innovation in enhancing efficiency and effectiveness.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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