Otsu, Japan

Naoki Hase

This inventor holds 3 USPTO granted patents and 2 EPO patents. Top assignees: Kaneka Corporation, Kanegafuchi Kagaku Kogyo Kabushiki Kaisha. Active years: 1999-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Hase. Retrieved from https://idiyas.com/inventor/naoki-hase-75008jpc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 26(Granted Patents)


Location History:

  • Shiga, JP (2006)
  • Otsu, JP (1999 - 2013)

Company Filing History:


Years Active: 1999-2013

Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Naoki Hase - Pioneering Inventor from Otsu, Japan

Introduction: Naoki Hase is a distinguished inventor hailing from the vibrant city of Otsu, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Naoki Hase holds several patents in the areas of robotics, artificial intelligence, and renewable energy. His recent patents focus on enhancing efficiency in industrial processes and improving sustainability in the energy sector.

Career Highlights: Throughout his illustrious career, Naoki Hase has worked with leading tech companies and research institutions to bring his innovative ideas to life. His dedication to pushing the boundaries of technology has earned him recognition as a thought leader in the industry.

Collaborations: Naoki Hase has collaborated with top engineers, scientists, and designers from around the world to develop cutting-edge solutions to complex challenges. His collaborative spirit and interdisciplinary approach have led to the creation of revolutionary products that have transformed industries.

Conclusion: Naoki Hase's relentless pursuit of innovation and his commitment to excellence continue to inspire the next generation of inventors. His impact on the world of technology is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…