Osaka, Japan

Naoki Haga

This inventor holds 1 USPTO granted patent. Top assignee: Keyence Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Haga. Retrieved from https://idiyas.com/inventor/naoki-haga-pdqmn6vi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Naoki Haga - Innovator in Magnifying Observation Technology

Introduction

Naoki Haga is a prominent inventor based in Osaka, Japan. He is known for his innovative contributions to the field of observation technology. His work focuses on enhancing user experience through advanced imaging techniques.

Latest Patents

Haga holds a patent for a magnifying observation apparatus. This invention allows users to easily obtain a magnified observation image that reflects their intentions. The apparatus features a side-view image capturing unit that displays a side-view image on a display unit. Users can designate an arbitrary position on the displayed image, and the apparatus is controlled based on this input.

Career Highlights

Naoki Haga is associated with Keyence Corporation, a leading company in automation and sensing technology. His role at Keyence has allowed him to develop and refine his innovative ideas, contributing to the company's reputation for cutting-edge technology.

Collaborations

Haga collaborates with Suguru Sekiya, a fellow innovator at Keyence Corporation. Their partnership fosters a creative environment that encourages the development of new technologies.

Conclusion

Naoki Haga's work in magnifying observation technology exemplifies the spirit of innovation. His contributions continue to impact the field positively, showcasing the importance of user-centered design in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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