Nagoya, Japan

Naoki Fujimoto


Average Co-Inventor Count = 4.7

ph-index = 1


Company Filing History:


Years Active: 2022-2024

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Naoki Fujimoto: Innovator in Vapor Phase Epitaxy Technology

Introduction

Naoki Fujimoto is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of vapor phase epitaxy, holding a total of 4 patents. His work focuses on advanced devices and methods that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Fujimoto's latest patents include a vapor phase epitaxial growth device. This device comprises a reactor vessel and a wafer holder arranged within the reactor vessel. The wafer holder features a surface designed to hold a wafer oriented substantially vertically downward. It includes a first material gas supply pipe positioned below the wafer holding surface, along with a second material gas supply pipe and a gas exhaust pipe, all strategically arranged to optimize gas flow and exhaust.

Another notable patent is for a gallium nitride vapor phase epitaxy apparatus. This apparatus is capable of doping magnesium and operates without using organic metal as a gallium raw material. It consists of a reactor vessel, a wafer holder, and multiple raw material gas supply pipes, each designed to facilitate the chemical reactions necessary for effective epitaxy.

Career Highlights

Fujimoto has worked with esteemed institutions such as the Tokai National Higher Education and Research System and Nagoya University. His experience in these organizations has allowed him to develop and refine his innovative technologies in semiconductor manufacturing.

Collaborations

Throughout his career, Fujimoto has collaborated with notable colleagues, including Shugo Nitta and Hiroshi Amano. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Naoki Fujimoto's contributions to vapor phase epitaxy technology have positioned him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing semiconductor manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…