Yokosuka, Japan

Naohisa Nakagawa


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: **Naohisa Nakagawa: Innovator in Silicon-Containing Films**

Introduction

Naohisa Nakagawa, an accomplished inventor based in Yokosuka, Japan, has made significant contributions to the field of materials science. With a focus on advanced deposition techniques, his research has paved the way for innovative methods in forming silicon-containing films.

Latest Patents

Mr. Nakagawa holds a patent titled "Precursors and processes for deposition of Si-containing films using ALD at temperature of 550° C. or higher." This patent presents methods for creating a silicon-containing film on a substrate by heating the substrate to temperatures above 550°C and exposing it to a vapor that includes a silicon-containing precursor. The innovation involves several chemical formulations, including compounds like SiRR(NH—SiR'), enhancing the efficiency and effectiveness of the atomic layer deposition (ALD) process.

Career Highlights

Naohisa Nakagawa's career is marked by his dedication to advancing methods of semiconductor production. He is associated with L'Air Liquide Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude, a renowned company known for its technological innovations and contributions to the gas and industrial process sector. His work has not only advanced the understanding of silicon deposition but has also demonstrated the potential for further applications in various industries.

Collaborations

In the course of his career, Mr. Nakagawa has collaborated with Jean-Marc Girard, a talented colleague whose insights and expertise have complemented Nakagawa's innovative approach. Their partnership exemplifies the importance of collaboration in driving forward technological advancements and fostering new ideas in research and development.

Conclusion

Naohisa Nakagawa’s contributions to the field of silicon deposition through his innovative patent highlight his role as a significant inventor. His work, supported by collaborations and a strong career foundation, continues to impact the materials science community and promises to influence future developments in semiconductor technology.

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