This inventor holds 3 USPTO granted patents. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1984-1988.
Company Filing History:
Years Active: 1984-1988
Title: Naohiro Tsuruta: Innovator in Polymer Chemistry
Introduction
Naohiro Tsuruta is a prominent inventor based in Fuji, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of photocurable compositions. With a total of 3 patents to his name, Tsuruta's work has advanced the understanding and application of poly(ethynylphenyl)acetylene and its copolymers.
Latest Patents
Tsuruta's latest patents focus on photocurable compositions of poly(ethynylphenyl)acetylene. These compositions include a linear polymer characterized by a recurring unit that can have various substituents, such as hydrogen atoms, alkyl groups, cycloalkyl groups, aryl groups, or halogen atoms. The weight-average molecular weight of these polymers ranges from 1,000 to 1,000,000. Additionally, he has developed a resin composition that consists of a polymer with specific recurring units and various agents to enhance casting, molding properties, and photocrosslinking capabilities.
Career Highlights
Naohiro Tsuruta is currently employed at Asahi Kasei Kogyo Kabushiki Kaisha, where he continues to innovate in the field of polymer science. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the industry.
Collaborations
Tsuruta has collaborated with notable coworkers, including Hideo Ai and Yohsuke Koizumi. Their combined expertise has fostered a productive environment for research and development in polymer applications.
Conclusion
Naohiro Tsuruta's contributions to polymer chemistry, particularly through his patents, highlight his role as an influential inventor in the field. His ongoing work at Asahi Kasei Kogyo Kabushiki Kaisha continues to push the boundaries of innovation in photocurable compositions.