Naohiko Okunishi

Title: Naohiko Okunishi: Innovator in Plasma Measurement Technologies

Introduction

Naohiko Okunishi is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma measurement technologies, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

Okunishi's latest patents include a method of measuring parameters of plasma, an apparatus for measuring parameters of plasma, and a plasma processing system. The apparatus for measuring parameters of plasma features a cutoff probe that consists of a first antenna designed to emit microwaves to the plasma, a second antenna that generates an electrical signal in response to the microwaves, and several protective layers to ensure the integrity of the components. Additionally, his impedance measurement jig allows for the individual measurement of the ESC and focus ring impedances in a substrate-processing apparatus, enhancing the inspection capabilities of these critical components.

Career Highlights

Naohiko Okunishi is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in advancing the methods used for plasma processing and measurement, which are vital for the production of high-quality semiconductor devices.

Collaborations

Okunishi has collaborated with notable colleagues, including Byeongsang Kim and Seungbo Shim, contributing to a dynamic team focused on innovation and excellence in their field.

Conclusion

Naohiko Okunishi's contributions to plasma measurement technologies reflect his dedication to innovation and excellence. His patents and work at Samsung Electronics Co., Ltd. highlight his role as a key figure in advancing semiconductor technology.