Kariya, Japan

Naohiko Isomura

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naohiko Isomura. Retrieved from https://idiyas.com/inventor/naohiko-isomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Naohiko Isomura: Innovator in Compressor Technology

Introduction

Naohiko Isomura is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of compressor technology. His innovative approach has led to the development of a unique method that enhances the efficiency of compressors.

Latest Patents

Naohiko Isomura holds a patent for a "Method for forming a film on a constituent part in a compressor." This invention is crucial for improving the performance and durability of compressor components. His patent portfolio reflects his commitment to advancing technology in this area.

Career Highlights

Isomura is associated with Kabushiki Kaisha Toyoda Jidoshokki Seisakusho, a prominent company in the automotive and machinery sector. His work at this organization has allowed him to apply his innovative ideas in practical applications. His contributions have been instrumental in enhancing the company's product offerings.

Collaborations

Naohiko Isomura has collaborated with talented individuals such as Shigeki Kawachi and Manabu Sugiura. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Naohiko Isomura is a distinguished inventor whose work in compressor technology has made a lasting impact. His patent and collaborations highlight his dedication to innovation in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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