Kyoto, Japan

Naofumi Takezono

This inventor holds 5 USPTO granted patents and 6 published patent applications. Top assignees: Murata Manufacturing Co., Ltd., Murata Manufacturing Co., Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naofumi Takezono. Retrieved from https://idiyas.com/inventor/naofumi-takezono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 80.0

Average Co-Inventor Count = 1.1

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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5 patents (USPTO):Explore Patents

Title: Naofumi Takezono: Innovator in High Frequency Modules and Power Amplifier Circuits

Introduction

Naofumi Takezono is an inventor based in Nagaokakyo-shi, Japan. He has made significant contributions to the fields of high frequency modules and power amplifier circuits. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Naofumi Takezono's recent patent applications include two notable inventions. The first is a **HIGH FREQUENCY MODULE**, which consists of a first capacitor connected to a first signal line, a second capacitor connected to a second signal line, and switches that allow for inspection and connection to a reference potential. The second application is a **POWER AMPLIFIER CIRCUIT**, which features multiple amplifiers and a harmonic suppression circuit designed to enhance signal quality across different frequency bands.

Conclusion

Naofumi Takezono's work in high frequency modules and power amplifier circuits showcases his innovative spirit and dedication to advancing technology. His latest patent applications reflect his potential to contribute significantly to the field in the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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