Sakai, Japan

Naoaki Izu Tani


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Naoaki Izu Tani: Innovator in Substrate Drying Technology

Introduction

Naoaki Izu Tani is a notable inventor based in Sakai, Japan. He has made significant contributions to the field of substrate drying technology. His innovative approach has led to the development of a unique device that enhances the efficiency of drying processes.

Latest Patents

Naoaki Izu Tani holds a patent for a "Method and device for drying substrate." This device is designed to store multiple substrates and includes a processing container for draining cleaning fluid after the substrates have been cleaned. It features an injection nozzle for smoothly supplying drying fluid, thereby eliminating or simplifying the need for exhaust equipment.

Career Highlights

Throughout his career, Tani has worked with prominent companies such as Toho Kasei Ltd. and Daikin Industries, Ltd. His experience in these organizations has contributed to his expertise in developing innovative drying solutions.

Collaborations

Tani has collaborated with notable professionals in his field, including Norio Maeda and Koji Sumi. Their combined efforts have further advanced the technology surrounding substrate drying.

Conclusion

Naoaki Izu Tani's contributions to substrate drying technology exemplify his innovative spirit and dedication to improving industrial processes. His patent and career achievements highlight his role as a significant figure in this field.

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