Kanagawa, Japan

Nao Uemoto

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nao Uemoto. Retrieved from https://idiyas.com/inventor/nao-uemoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nao Uemoto: Innovator in Liquid Application Technology

Introduction

Nao Uemoto is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of liquid application technology. His innovative work has led to the development of a unique liquid application apparatus that enhances the efficiency of liquid application processes.

Latest Patents

Uemoto holds a patent for a "Liquid application apparatus, liquid application method, and storage medium." This invention includes a liquid discharge head and processing circuitry. The liquid discharge head is designed to discharge liquid, while the processing circuitry enables the apparatus to move sequentially across divided areas of a liquid application zone. This allows for precise liquid application, ensuring that images generated by consecutive applications are seamlessly connected.

Career Highlights

Nao Uemoto is currently employed at Ricoh Company, Ltd., where he continues to innovate in the field of liquid application technology. His work has been instrumental in advancing the capabilities of liquid application systems, making them more efficient and effective.

Collaborations

Uemoto collaborates with Yuki Tsuchiya, a talented woman in the field. Together, they work on projects that push the boundaries of liquid application technology.

Conclusion

Nao Uemoto's contributions to liquid application technology exemplify the spirit of innovation. His patent and ongoing work at Ricoh Company, Ltd. highlight his commitment to advancing this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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