Company Filing History:
Years Active: 2025
Title: Nao Okumura: Innovator in Protective Film Technology
Introduction
Nao Okumura is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of protective film technology. Her innovative methods have the potential to enhance various applications in manufacturing and materials science.
Latest Patents
Nao Okumura holds a patent for a "Method for forming protective film, method for manufacturing patterned substrate, and composition." This patent describes a method for forming a protective film that involves coating only the periphery of a substrate with a specific composition. The composition includes a compound with an aromatic ring and a solvent. Notably, the solvent contains a first solvent with a normal boiling point between 156° C. and 300° C. The first solvent is preferably an ester, alcohol, ether, or carbonate, and its content in the solvent is ideally between 20 mass % and 100 mass %.
Career Highlights
Nao Okumura is currently associated with JSR Corporation, where she continues to develop innovative solutions in her field. Her work has garnered attention for its practical applications and potential impact on the industry.
Collaborations
Nao collaborates with esteemed colleagues, including Kazunori Takanashi and Hiroyuki Miyauchi. Their combined expertise contributes to the advancement of technology in protective films and substrates.
Conclusion
Nao Okumura is a trailblazer in the field of protective film technology, with her innovative methods and collaborations paving the way for future advancements. Her contributions are vital to the ongoing evolution of materials science and manufacturing processes.