Nandkishore Patidar

Title: Nandkishore Patidar: Innovator in Chemical Mechanical Polishing Technology

Introduction

Nandkishore Patidar is a notable inventor based in Barwaha, India. He has made significant contributions to the field of chemical mechanical polishing (CMP) systems, which are essential in the manufacturing of electronic devices. His innovative methods have the potential to enhance the efficiency and reliability of substrate processing.

Latest Patents

Nandkishore Patidar holds a patent titled "Methods of detecting non-conforming substrate processing events during chemical mechanical polishing." This patent focuses on methods for detecting issues during the polishing process of substrates, particularly silicon carbide. The invention involves monitoring the temperature of the polishing pad and initiating a response if the temperature change exceeds a certain threshold. This advancement aims to improve the quality control in CMP systems.

Career Highlights

Nandkishore Patidar is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his expertise in CMP technology and contribute to the development of advanced manufacturing processes.

Collaborations

He has collaborated with notable colleagues such as Jeonghoon Oh and Ashish Bhushan. These collaborations have likely fostered innovation and the sharing of ideas within the field of chemical mechanical polishing.

Conclusion

Nandkishore Patidar's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in substrate processing technology, which is crucial for the electronics industry.