Nancy E Iwamoto

Title: Nancy E Iwamoto: Innovator in Lithographic Materials

Introduction

Nancy E Iwamoto is a prominent inventor based in Portland, OR (US). She has made significant contributions to the field of lithographic materials, holding a total of three patents. Her work focuses on developing advanced photoresists that enhance the performance and stability of lithographic processes.

Latest Patents

Iwamoto's latest patents include innovations such as thermally stable photoresists with high sensitivity. This invention discloses specific lithographic polymeric materials and methods that utilize these materials. The polymeric materials are designed to be transparent to deep UV radiation, allowing for effective imaging. They also exhibit thermal stability at temperatures exceeding 160 degrees Celsius and resist excessive crosslinking when heated, ensuring they remain soluble in common lithographic developers. Another notable patent relates to high sensitivity resists that have increased autodecomposition temperatures. This advancement is achieved by selecting sidechain structures that enhance stability, which is crucial for the performance of the resists.

Career Highlights

Throughout her career, Nancy E Iwamoto has worked with various companies, including Optical Data, Inc. Her expertise in the field has led to significant advancements in lithographic technology, making her a respected figure among her peers.

Collaborations

Iwamoto has collaborated with notable individuals such as William R Brunsvold and Willard E Conley. These collaborations have contributed to her innovative work and the development of her patents.

Conclusion

Nancy E Iwamoto's contributions to the field of lithographic materials have established her as a leading inventor. Her patents reflect her commitment to advancing technology in this area, and her collaborations further enhance her impact on the industry.