Other

International Business Machines Corporation

Optical Data, Inc.

Nancy E Iwamoto

William R Brunsvold

Willard E Conley

Dale M Crockatt

Hiroshi Ito

John W Swanson

Jean M Frechet

Carlton G Willson

W Eugene Skiens

Michael A Lind

George J Hefferon

Ming-Fea Chow

John S Hartman

The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permit deep UV imaging, can be used to produce resist structures having thermal stability at temperatures greater than about 160.degree. C., and are sufficiently resistant to excessive crosslinking when heated to temperatures ranging from about 160.degree. C. to about 250.degree. C. that they remain soluble in common lithographic developers and strippers. The present invention also discloses resists comprising substituted polyvinyl benzoates which, after imaging, exhibit unexpectedly high thermal stability, in terms of plastic flow. These resists cannot be imaged using deep UV because they exhibit such a high degree of opacity below 280 nm; however, they are useful as the top, imaging layer in a bilayer resist process wherein the top layer acts as a mask during deep UV exposure of the bottom layer.

Thermally stable photoresists with high sensitivity

The present invention relates to increasing the autodecomposition temperature of particular resists. The resists are comprised of structures having recurrent acid labile groups which are typically pendant to the polymeric backbone. The autodecomposition temperature of a resist is increased by selecting substituent sidechains on the acid labile group which exhibit increased stability. Sidechain structures which provide increased autodecomposition stability include secondary structures capable of forming secondary carbonium ion intermediates and having an available proton adjacent to the carbonium ion formed during cleavage. Moieties which can be used as the secondary sidechain structures include secondary alkyl, including both cyclic and alicyclic alkyl, substituted deactivated secondary benzyl, and 1-(deactivated heterocyclic) secondary alkyl.

High sensitivity resists having autodecomposition temperatures greater

An optical data storage medium includes a triple layer recording structure having an expansion layer, a retention layer and a very thin reflective layer interposed between the retention and expansion layers. The three layers are strongly bonded together so that the thermally and mechanically active expansion and retention layers can mechanically act upon each other through the intermediate reflective layer. The expansion and retention layers are dyed to selectively pass or absorb light of preselected wavelengths. The thin reflective layer is adapted to partially pass and partially reflect light of preselected wavelengths.

Bump-forming media including thin intermediate reflective layer and

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Portland, OR, United States of America

Nancy E Iwamoto