Nanako Tamari

Title: Innovations of Nanako Tamari in Plasma Processing Technology

Introduction

Nanako Tamari is a prominent inventor based in Tokyo, Japan, known for her significant contributions to plasma processing technology. With a total of five patents to her name, she has made remarkable advancements in methods and apparatuses for plasma etching and cleaning processes.

Latest Patents

One of her latest patents is a plasma processing method designed to effectively remove complex depositions of metal and non-metal materials in a processing chamber. This method aims to reduce particle generation during the etching of semiconductor substrates. The process involves a series of steps, including plasma-etching samples, followed by a metal removing step using plasma, and a non-metal removing step with a different plasma, which are repeated multiple times. Another notable patent is a plasma processing apparatus that features a chamber with an electrode for substrate placement, a power supply, and a control device. This apparatus is capable of executing various discharge conditions to control the temperature and processing of the substrate effectively.

Career Highlights

Throughout her career, Nanako Tamari has worked with esteemed companies such as Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. Her experience in these organizations has allowed her to refine her expertise in plasma processing technologies and contribute to innovative solutions in the field.

Collaborations

Nanako has collaborated with notable colleagues, including Kosa Hirota and Masahiro Sumiya, who have played a role in her research and development efforts.

Conclusion

Nanako Tamari's work in plasma processing technology showcases her innovative spirit and dedication to advancing the field. Her patents reflect her commitment to improving processes that are crucial in semiconductor manufacturing.