Ibaraki, Japan

Nami Ohashi

This inventor holds 1 USPTO granted patent. Top assignee: Riso Kagaku Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nami Ohashi. Retrieved from https://idiyas.com/inventor/nami-ohashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Nami Ohashi: Innovator in Screen Printing Technology

Introduction

Nami Ohashi is a prominent inventor based in Ibaraki, Japan. She has made significant contributions to the field of screen printing technology. Her innovative work has led to the development of a unique treatment liquid for screen printing plates.

Latest Patents

Nami Ohashi holds a patent for a treatment liquid for screen printing plates and a method for treating these plates. The patent describes a treatment liquid that contains a resin, water, a surfactant A, and a surfactant B. Surfactant B has a solubility in water that is lower than that of surfactant A. This innovative approach enhances the efficiency and effectiveness of screen printing processes.

Career Highlights

Ohashi is currently employed at Riso Kagaku Corporation, a company known for its advancements in printing technology. Her work at Riso Kagaku Corporation has allowed her to focus on developing solutions that improve screen printing techniques.

Collaborations

Nami Ohashi has collaborated with notable colleagues, including Hirotaka Tominaga and Hiroshi Hayashi. These collaborations have contributed to her success and the advancement of technology in her field.

Conclusion

Nami Ohashi is a trailblazer in the realm of screen printing technology, with her innovative patent showcasing her expertise and dedication. Her contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…