Tainan, Taiwan

Nai-Ting Chang

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Himax Technologies, Inc.. Active years: 2021-2023.

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: Innovations of Nai-Ting Chang

Introduction

Nai-Ting Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of technology, particularly in image processing and thermal compensation systems. With a total of 2 patents, his work showcases innovative solutions that address complex challenges in imaging technology.

Latest Patents

Nai-Ting Chang's latest patents include a "System and method for handling a thermal compensation." This system involves an image capturing device that captures images while detecting temperature variations. It also includes a projecting device and a processing device that compensates images based on temperature data. Another significant patent is the "Depth decoding system and method for ground truth image rectification." This invention features a depth decoder system that utilizes a projector and camera to rectify ground-truth images, generating accurate depth results.

Career Highlights

Nai-Ting Chang is currently employed at Himax Technologies, Inc., where he continues to develop innovative technologies. His work has been instrumental in advancing imaging systems, making them more efficient and effective in various applications.

Collaborations

Some of his notable coworkers include Yi-Nung Liu and Chin-Jung Tsai, who have collaborated with him on various projects, contributing to the success of their innovations.

Conclusion

Nai-Ting Chang's contributions to technology through his patents and work at Himax Technologies, Inc. highlight his role as a leading inventor in the field of imaging technology. His innovative solutions continue to pave the way for advancements in this area.

Profile summary based on public USPTO records.
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