This inventor holds 1 USPTO granted patent. Top assignee: Fuji Photo Film Company, Limited. Active years: 1977.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1977
Title: The Innovations of Nagao Kameji
Introduction
Nagao Kameji is a notable inventor from Ashigara, Japan, recognized for his contributions to photographic technology. He has made significant strides in the field of light-sensitive materials, which are essential for photography.
Latest Patents
Kameji holds a patent for "Layers used to prevent reticulation in photographic elements." This invention involves a photographic light-sensitive material that includes a support and a non-light sensitive uppermost layer made of at least one organic synthetic high polymer compound. The patent also describes the inclusion of at least one light-sensitive layer situated between the support and the uppermost layer. The organic high polymer compound is selected from a specific group of polymers, enhancing the quality and functionality of photographic materials.
Career Highlights
Kameji is associated with Fuji Photo Film Company, Limited, where he has contributed to advancements in photographic technology. His work has played a crucial role in improving the performance and reliability of photographic products.
Collaborations
Kameji has collaborated with notable colleagues, including Ikutaro Horie and Takushi Miyazako, who have also made significant contributions to the field of photography.
Conclusion
Nagao Kameji's innovative work in photographic materials has left a lasting impact on the industry. His patent demonstrates a commitment to enhancing photographic technology, ensuring better quality for users.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile