Nagamasa Shiokawa

Title: Nagamasa Shiokawa: Innovator in Semiconductor Manufacturing

Introduction

Nagamasa Shiokawa is a notable inventor based in Nobeoka, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of three patents. His work focuses on enhancing the quality and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is a method of manufacturing a semiconductor device that provides a high-quality thermal oxide film. This innovative process involves a cooling step after replacing the atmosphere in the diffusion furnace with a high purity gas mixture of nitrogen (99%) and oxygen (1%). Following oxidizing and annealing steps, a pump is activated to evacuate a load-lock chamber, which is then filled with nitrogen. While feeding the gas mixture into the diffusion furnace, a wafer boat is transferred from the diffusion furnace to the load-lock chamber. This method ensures that the cooling and removing steps occur under a high purity atmosphere, allowing only high purity oxygen to be introduced at the interface between the silicon substrate and the oxide film. As a result, a high-quality thermal oxide film is achieved.

Career Highlights

Nagamasa Shiokawa is currently employed at Asahi Kasei Microsystems Co., Ltd., where he continues to develop innovative solutions in semiconductor technology. His expertise and dedication to his work have made him a valuable asset to the company.

Collaborations

He collaborates with Atsushi Yamamoto, contributing to advancements in their field through teamwork and shared knowledge.

Conclusion

Nagamasa Shiokawa's contributions to semiconductor manufacturing highlight his innovative spirit and commitment to quality. His patents reflect a deep understanding of the complexities involved in creating high-performance semiconductor devices.