Nader Shamma

Title: Nader Shamma: Innovator in Lithographic Systems

Introduction

Nader Shamma is a prominent inventor based in Los Altos, California. He has made significant contributions to the field of lithographic systems, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of Nader Shamma's latest patents is titled "Method and apparatus for determining a feature-forming variant." This invention involves a method of determining a feature-forming variant, such as focus or exposure, for a lithographic system. The process includes Fourier processing that extracts a figure of merit. In a preferred embodiment, the lithographic system fabricates a series of formations of a single pattern. An optical image of each exposure is formed, and a Fourier power spectrum is determined for each optical image. An angular power function is extracted from each power spectrum by quantifying optical power along lines originating at various angles from the origin of the power spectrum. The distribution of on-axes and off-axes power is quantified for each angular power function, allowing for the determination of an optimum for the lithographic system based on the extracted data. The extraction of an angular power function from the associated Fourier power spectrum improves the signal-to-noise ratio.

Another significant patent by Nader Shamma is the "Method of making a mask for proximity effect correction in projection." This invention modifies reticle data used to form a reticle pattern to substantially compensate for proximity effects resulting from the diffraction of light by opaque portions of the reticle pattern. The modification ensures that the exposed pattern on the wafer results in a desired pattern, where isolated features and features in a dense pattern of features formed on the wafer will be identical and have predictable characteristics.

Career Highlights

Nader Shamma is currently employed at Hewlett-Packard Company, where he continues to innovate and contribute to advancements in lithographic technology. His work has had a significant impact on the efficiency and effectiveness of lithographic systems.

Collaborations

Throughout his career, Nader has collaborated with notable colleagues, including Frederik Sporon-Fiedler and Edward Lin. These collaborations have further enhanced his contributions to the field.

Conclusion

Nader Shamma is a distinguished inventor whose work in lithographic systems has led to valuable patents that improve technology in this area. His innovative methods and collaborative efforts continue to shape the future of lith